Multiscale modeling and systemic analysis of chemical vapor deposition processes

نویسندگان

  • Nikolaos Cheimarios
  • N. Cheimarios
چکیده

Two multiscale computational frameworks are proposed for coupling/linking the co-existing scales in chemical vapor deposition (CVD)processes: From the macro-scale of a CVD reactor (~cm or m) to the transport inside micro-features (~μm) and kinetic Monte Carlo techniques in the nano-scale (~nm). To accelerate the computations parallel processing techniques are used. Moreover, a computational framework, based on projection type methods, is proposed to enable “black box” CFD codes to perform nonlinear systemic analysis tasks.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations

We are motivated to compute delicate chemical vapor deposition (CVD) processes. Such processes are used to deposit thin films of metallic or ceramic materials, such as SiC or a mixture of SiC and TiC. For practical simulations and for studying the characteristics in the deposition area, we have to deal with delicate multiscale models. We propose a multiscale model based on two different softwar...

متن کامل

Compositional Modeling of Wax Formation in Petroleum Mixtures

Heavy organics deposition is a common problem in oil industry, especially in oil production, transportation and processing. Wax or solid paraffin series are examples of heavy organics that deposit. Precipitation and crystallization of wax causes major difficulties in different processes. Based on multi-solid theory, a basic model is modified in this paper for wax precipitation in different oils...

متن کامل

Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells

This work focuses on the development of a multiscale computational fluid dynamics (CFD) simulation framework with application to plasma-enhanced chemical vapor deposition of thin film solar cells. A macroscopic, CFD model is proposed which is capable of accurately reproducing plasma chemistry and transport phenomena within a 2D axisymmetric reactor geometry. Additionally, the complex interactio...

متن کامل

The Effect of Knudsen Number on Transient Times During Chemical Vapor Deposition

Models for the individual steps used to fabricate integrated circuits (ICs) are of interest in order to improve fabrication efficiency and improve process designs. Here we focus on deposition from the gas stream, in which the dominant species is an inert carrier gas, as it flows across a wafer on which ICs are being fabricated. We model the transport of gaseous species to the surface and hetero...

متن کامل

A multiscale domain decomposition approach for chemical vapor deposition

We consider the chemical vapor deposition process on a trenched Si-substrate. To understand the process (e.g. the layer conformality) at the trench scale (microscale), we need solutions at both the trench and reactor scales (macroscale). Due to huge difference in the sizes of these scales, straightforward numerical computations are very challenging. To overcome this difficulty, we consider a mu...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2016